Copyright © 2022 StrategyHelix Inc. All Rights Reserved.
Global Sputtering Targets Market 2021
5 November 2021
Sputtering targets are materials from which thin films are grown by sputtering method, and the targets are fabricated by processing metals or ceramics. The global sputtering targets market is set to grow by US$ 1.43 billion during 2021-2027, growing at a compound annual growth rate (CAGR) of 6.4% during the forecast period, according to data and analytics company StrategyHelix.
The report provides up-to-date market size data for period 2017-2020 and forecast to 2027 covering key market aspects like sales value for sputtering targets. The global sputtering targets market is segmented on the basis of material, application, region. By material, it is categorized into metals & pure elements, oxides, alloys, and others. The metals & pure elements segment held the largest market share in 2020. By application, the sputtering targets market is divided into data storage, displays, energy, industrial, microelectronics, optical coatings, and others. The energy segment accounted for the largest market share in 2020. Based on region, the sputtering targets market is divided into North America, Asia Pacific, Europe, and Rest of the World (ROW).
The report has profiled some of the key players of the market such as Beijing Goodwill Metal Technology Co. Ltd., China New Metal Materials Technology Co. Ltd., Corning Inc., Daido Steel Co. Ltd., FURUYA METAL Co. Ltd., GRIKIN Advanced Material Co. Ltd, H.C. Starck GmbH, Hitachi Metals Ltd., Honeywell International Inc., JX Nippon Mining & Metals Corporation, Kobe Steel Ltd., Materion Corporation, Mitsui Mining & Smelting Co. Ltd. (MMS), Plansee SE, Praxair Inc., Sumitomo Chemical Co. Ltd., Tosoh Corporation, ULVAC Inc., Umicore N.V..
The report is an invaluable resource for companies and organizations active in this industry. It provides a cohesive picture of the sputtering targets market to help drive informed decision making for industry executives, policy makers, academic, and analysts.
Material: metals & pure elements, oxides, alloys, and others
Application: data storage, displays, energy, industrial, microelectronics, optical coatings, and others
Region: North America, Asia Pacific, Europe, and Rest of the World (ROW)
Years Considered: this report covers the period 2017 to 2027
Key Benefits for Stakeholders
Get a comprehensive picture of the global sputtering targets market
Pinpoint growth sectors and trends for investment
Understand what the future of the global sputtering targets market looks like
Identify the competitive landscape and window of opportunity
Table of Contents
1. Market Definition
2. Research Methodology
3. Market Data & Outlook
3.1 Market Value
3.2 Market Value Forecast
4. Sputtering Targets Market by Material
4.1 Metals & Pure Elements
5. Sputtering Targets Market by Application
5.1 Data Storage
5.6 Optical Coatings
6. Sputtering Targets Market by Region
6.1 North America
6.2 Asia Pacific
6.4 Rest Of The World (Row)
7. Company Profiles
7.1 Beijing Goodwill Metal Technology Co., Ltd.
7.2 China New Metal Materials Technology Co., Ltd.
7.3 Corning Inc.
7.4 Daido Steel Co., Ltd.
7.5 FURUYA METAL Co., Ltd.
7.6 GRIKIN Advanced Material Co., Ltd
7.7 H.C. Starck GmbH
7.8 Hitachi Metals, Ltd.
7.9 Honeywell International Inc.
7.10 JX Nippon Mining & Metals Corporation
7.11 Kobe Steel, Ltd.
7.12 Materion Corporation
7.13 Mitsui Mining & Smelting Co., Ltd. (MMS)
7.14 Plansee SE
7.15 Praxair, Inc.
7.16 Sumitomo Chemical Co., Ltd.
7.17 Tosoh Corporation
7.18 ULVAC, Inc.
7.19 Umicore N.V.
8.1 About StrategyHelix